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Canon vs ASML: Who will emerge victorious in this battle of the giants?
In the field of high-tech chip manufacturing, the Dutch company ASML has long held a leading position. However, Canon's innovative lithographic technology is poised to offer some serious competition.
On Friday, Japanese giant Canon, widely known for its professional cameras, announced a new technology based on nanocamp lithography (NIL). According to the company, this technology will allow you to create elements with a technical process of up to 5 nm. Based on further research, Canon plans to achieve the production of elements with a 2 nm process, ensuring high quality and minimal defects.
Canon's nanocamp lithography (NIL) technology is a serious competitor to ASML's ultraviolet lithography (EUV). A distinctive feature of NIL is its independence from the complex optical systems and mirrors used in EUV. This could allow Canon to circumvent U.S. export restrictions on advanced chip equipment destined for China.
The principle of operation of Canon technology is to apply a mask with a design applied to the resistive layer of the crystal, similar to the printing process. As the company emphasized, this allows you to create complex two-and three-dimensional diagrams in one motion.
However, despite Canon's ambitious claims of a 5nm process technology, Gartner analyst Gaurav Gupta expressed concerns. He noticed: "It would be amazing if Canon really made a breakthrough." Gupta also added that real changes in the market should be expected no earlier than in five years, and the focus will be on memory technology.
However, if the technology proves to be an effective solution for creating the latest logic circuits, Gupta suggests that there may be restrictions on its export to China.
In the field of high-tech chip manufacturing, the Dutch company ASML has long held a leading position. However, Canon's innovative lithographic technology is poised to offer some serious competition.
On Friday, Japanese giant Canon, widely known for its professional cameras, announced a new technology based on nanocamp lithography (NIL). According to the company, this technology will allow you to create elements with a technical process of up to 5 nm. Based on further research, Canon plans to achieve the production of elements with a 2 nm process, ensuring high quality and minimal defects.
Canon's nanocamp lithography (NIL) technology is a serious competitor to ASML's ultraviolet lithography (EUV). A distinctive feature of NIL is its independence from the complex optical systems and mirrors used in EUV. This could allow Canon to circumvent U.S. export restrictions on advanced chip equipment destined for China.
The principle of operation of Canon technology is to apply a mask with a design applied to the resistive layer of the crystal, similar to the printing process. As the company emphasized, this allows you to create complex two-and three-dimensional diagrams in one motion.
However, despite Canon's ambitious claims of a 5nm process technology, Gartner analyst Gaurav Gupta expressed concerns. He noticed: "It would be amazing if Canon really made a breakthrough." Gupta also added that real changes in the market should be expected no earlier than in five years, and the focus will be on memory technology.
However, if the technology proves to be an effective solution for creating the latest logic circuits, Gupta suggests that there may be restrictions on its export to China.
